发明名称 Floating gate memory cell with a metallic source/drain and gate, and method for manufacturing such a floating gate memory gate cell
摘要 Floating gate memory cell having a first layer with first and second source/drain regions and a channel region arranged between and next to the first and second source/drain regions, and a floating gate layer arranged on the first layer, wherein the first and second source/drain regions and the floating gate layer are formed of a metallically conductive material, and the channel region is formed of an electrically insulating material.
申请公布号 US7385243(B2) 申请公布日期 2008.06.10
申请号 US20040926838 申请日期 2004.08.25
申请人 INFINEON TECHNOLOGIES AG 发明人 GRAHAM ANDREW;HOFMANN FRANZ;SPECHT MICHAEL
分类号 H01L21/8247;H01L29/30;H01L21/28;H01L21/336;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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