| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing composition capable of performing a higher speed-polishing. <P>SOLUTION: The polishing composition of this invention is a polishing composition, preferable to a metallic film, particularly preferable to a copper film, and contains ammonia, ammonium salt and hydrogen peroxide, and the residue is water. As the ammonium salt, ammonium chloride and ammonium carbonate are preferable. Further, the polishing composition may contain grinding stone, it is preferable that the grinding stone is contained in such an application that surface smoothness is particularly required after polishing. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
