发明名称 A CHAMBER DEVICE
摘要 A chamber apparatus is provided to prevent an exterior gas or impurities from flowing in the chamber through a fine gap by providing an o-ring and a curtain gas thereto and thereby enhancing the airtight of the chamber. A chamber apparatus includes a frame(140), a pressing base, a chamber(100), a cylinder, and a tension spring(135). The frame has a base frame and a side frame extending vertically from an edge of the base frame. The pressing base has a shape of an ellipse and is perpendicular to the base frame. The chamber has a lower case installed on the base frame and an upper case placed between the lower case and the pressing base. The upper case is combined with the pressing base by the plurality of joint pins and is transferred on the lower case in a vertical direction by the pressing base, such that an airtight space is formed between the upper and lower cases. The cylinder is installed on the base frame and a drive unit is coupled to the pressing base, allowing the pressing base to move along the vertical direction. The tension spring is installed on the pressing base and the upper case by the plurality of joint pins.
申请公布号 KR100835162(B1) 申请公布日期 2008.06.04
申请号 KR20080027627 申请日期 2008.03.26
申请人 TALON TECH CO., LTD. 发明人 KIM, YOUNG TAE;PARK, KUEN SU;KIM, KYOUNG SU
分类号 H01L21/205 主分类号 H01L21/205
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