摘要 |
A thin film transistor substrate and a method for manufacturing the same are provided to reduce the number of etching masks and reduce a defect generated in forming pixel electrodes by avoiding lift-off. A thin film transistor substrate(100) includes gate wiring formed on an insulating substrate(10), including gate lines(22_1,22_2), gate electrodes(26_1,26_2), and maintenance electrodes(27_1,27_2) made of a first conductive material for gate wiring and a second conductive material for gate wiring, and gate ends(24_1) made of a first conductive material for gate wiring. Data wiring includes data lines(62) crossing the gate lines, and source and drain electrodes(65,66) formed on the gate electrodes, separated from each other. Pixel electrodes(82) are electrically connected with the drain electrodes. Auxiliary gate ends(84) are electrically connected with the gate ends, made of the same material as the pixel electrodes. |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SHIN, WON SUK;PARK, HONG SICK;CHOUNG, JONG HYUN;HONG, SUN YOUNG;KIM, BONG KYUN;LEE, BYEONG JIN |