| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a perfluoropolyether liquid pellicle which can be used in a photolithography projection device which provides a patterned projection beam such as a radiation of 157 nm or a radiation so as to print a pattern on a substrate, and also provide a mask-cleaning method using a perfluoropolyether liquid. <P>SOLUTION: A patterning device includes a material layer 31, a patterned opaque material layer 32 on the surface of the material layer, and a pellicle 40 of a perfluoropolyether (PFPE) liquid, the pellicle covering the surface. In order to provide the patterning device 32, which has the material layer 31 and the patterned layer of the opaque material, on the surface of the material layer and form the PFPE liquid layer 40, the PFPE liquid which covers the surface is applied to the surface, and at least a part of the PFPE liquid layer is removed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
