| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method and a system for removal volatile residues from a substrate. <P>SOLUTION: The process of removal volatile residues is performed en route in a system while performing a halogen treating process on a substrate. The process of eliminating volatile residues is performed in the system except a halogen treatment chamber and an FOUP. The method of eliminating volatile residues from a substrate includes a step of preparing a processing system with a vacuum-tight platform, a step of processing a substrate through a chemistry including halogen in a processing chamber of the platform, and a step of processing the processed substrate in the platform and discharge volatile residues from the processed substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
