| 摘要 |
PROBLEM TO BE SOLVED: To provide a regeneration method and a generation device for an etching waste liquid where an Mo component and an Al component in an etching waste liquid comprising phosphoric acid are removed, so as to regenerate the same. SOLUTION: The regeneration device for an etching waste liquid comprises: a waste liquid storage tank 4 for storing an etching waste liquid; a dilution part 5 for diluting the etching waste liquid in the waste liquid storage tank 4 in such a manner that its pH reaches 0.5 to 0.9; adsorption towers 14, 15 each packed with a porous strongly acidic cation exchange resin in which a functional terminal group is an H group; adsorption towers 20, 21 each packed with a porous strongly acidic anion exchange resin in which a functional terminal group is an OH group; a waste liquid feed part 8 for feeding the etching waste liquid in the waste liquid storage tank 4 to the adsorption towers 14, 15; connection tubes 16, 17 for connecting the adsorption towers 14, 15 with the adsorption towers 20, 21; and a concentration part 22 for removing moisture from the diluted etching waste liquid made to flow out from the adsorption towers 20, 21, and concentrating the same. COPYRIGHT: (C)2008,JPO&INPIT |
