| 摘要 |
A movable stage apparatus includes a reticle stage on which a reflecting reticle is to be mounted, in which when a space is divided by a plane including a reflection surface of the reticle, a guide surface to guide movement of the master reticle stage is arranged in a space opposite to a space where an exposure light beam to be reflected by the reticle passes. The reticle stage includes a coarse movement stage which reciprocally moves on the guide surface formed on a base of the movable stage apparatus in a scanning direction along the guide surface in non-contact with the coarse movement stage and has a six-axis alignment mechanism. The reflection surface of the reticle is arranged to face vertically downward, and the fine movement stage is supported in non-contact with the coarse movement stage and is positioned in six-axis directions by a six-axis alignment mechanism, and by a self weight support mechanism which supports a weight of the fine movement stage.
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