METHOD FOR FORMING POLYIMIDE PATTERN, ARTICLE, AND SUSPENSION FOR HARD DISK

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a polyimide pattern containing no photosensitive agent, without having to use a water-insoluble organic solvent.

SOLUTION: The method includes steps of (A) forming a polyimide precursor layer on a substrate; (B) forming a positive photoresist layer on the polyimide precursor layer; (C) selectively exposing the positive photoresist layer; (D) selectively removing and patterning the underlayer polyimide precursor layer, after or during developing the positive photoresist layer; (E) exposing the entire surface of the patterned positive photoresist layer; (F) at least partially imidizing the patterned polyimide precursor layer, to decrease the solubility with a basic aqueous solution or a water-soluble basic substance; and (G) stripping the patterned positive photoresist layer by the basic aqueous solution or the water-soluble basic substance.

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