| 摘要 |
PROBLEM TO BE SOLVED: To improve a process margin for field connection to increase manufacturing yields in a data forming method for electron beam lithography, an electron beam lithography method, a method of manufacturing a semiconductor device, and an electron beam lithography device. SOLUTION: When design data are divided for each field of an electron beam lithography device, a decision table is produced to determine whether a field boundary 4 should be disposed on patterns 1 and 2 or on a space 3 according to the sizes of the drawn patterns 1 and 2 and the size of the space 3 formed between the pattern 1 and another pattern 2, and the position of the field boundary 4 is determined based on the decision table. COPYRIGHT: (C)2008,JPO&INPIT
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