| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition device having a plasma discharge means where the counterflow of treatment gas is prevented, and satisfactory film quality can be imparted by a uniform gas flow, to provide a film deposition method, and to provide a thin film. <P>SOLUTION: The inside of a region between a treatment gas feeding means and each roll electrode is provided with each blade in which one end is abutted on each roll electrode and the other end is fitted to the treatment gas feeding means, respectively. <P>COPYRIGHT: (C)2008,JPO&INPIT |
