发明名称 |
APPARATUS FOR CRYSTALLIZING DIAMOND FILM BY DIRECT CURRENT PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION |
摘要 |
PURPOSE: An apparatus for crystallizing diamond film by DC PACVD is provided for maximizing degree of crystallization and uniformity and minimizing temperature differences between anodes to eliminate unstability of the apparatus. CONSTITUTION: The DC PACVD apparatus has seven anodes each of them being fixed to top plate (11) connected with a vacuum chamber (1) by O-ring (12). The anode is jointed to copper block (6) by suspending bar (5) and consequently to DC power supply (8) through ballast resistance (9). The anode has a smaller diameter than for such suspending bar to prevent heat of anode from transferring into such copper block to effectively maintain temperature of the anode to 2000 deg.C or more.
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申请公布号 |
KR20010001896(A) |
申请公布日期 |
2001.01.05 |
申请号 |
KR19990021389 |
申请日期 |
1999.06.09 |
申请人 |
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
BAEK, YEONG JUN;EUN, GWANG YONG;LEE, JAE GAP |
分类号 |
C23C16/52;C23C16/27;C23C16/503;H01J37/32;(IPC1-7):C23C16/52 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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