发明名称 APPARATUS FOR CRYSTALLIZING DIAMOND FILM BY DIRECT CURRENT PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION
摘要 PURPOSE: An apparatus for crystallizing diamond film by DC PACVD is provided for maximizing degree of crystallization and uniformity and minimizing temperature differences between anodes to eliminate unstability of the apparatus. CONSTITUTION: The DC PACVD apparatus has seven anodes each of them being fixed to top plate (11) connected with a vacuum chamber (1) by O-ring (12). The anode is jointed to copper block (6) by suspending bar (5) and consequently to DC power supply (8) through ballast resistance (9). The anode has a smaller diameter than for such suspending bar to prevent heat of anode from transferring into such copper block to effectively maintain temperature of the anode to 2000 deg.C or more.
申请公布号 KR20010001896(A) 申请公布日期 2001.01.05
申请号 KR19990021389 申请日期 1999.06.09
申请人 KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 BAEK, YEONG JUN;EUN, GWANG YONG;LEE, JAE GAP
分类号 C23C16/52;C23C16/27;C23C16/503;H01J37/32;(IPC1-7):C23C16/52 主分类号 C23C16/52
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