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发明名称
利用准直透镜而用于高功率雷射二极体退火系统之快轴光束波形塑形
摘要
一种用于退火处理半导体工作部件的动态表面退火设备包括:用于支撑工作部件的工作部件支撑件、光源、和沿着快轴相对扫描光源与工作部件支撑件的扫瞄设备。光源包括雷射发射器阵列,其大致排成发射器的接续行列,且行列横切于快轴。多个准直透镜各自位在发射器行列上方,且提供沿着快轴的准直。所选透镜具有一或一连串对应于针对各发射器行列沿着快轴之光束偏离的偏光角度。光学仪器使雷射发射器阵列的光线聚焦至工作部件的表面,以形成横切快轴的连续光束线,该些光束线系依偏光角度而沿着快轴相隔开。
申请公布号
TW200816322
申请公布日期
2008.04.01
申请号
TW096129690
申请日期
2007.08.10
申请人
应用材料股份有限公司
发明人
杰宁斯狄恩;梅尔艾伯希拉许J. MAYUR, ABHILASH J.;汤玛士提摩西N. THOMAS, TIMOTHY N.;巴瑞哈尔维杰;亚秋沙拉门芬达布朗S. ACHUTHARAMAN, VEDAPURAM S.;萨库瑞希尔P.S. THAKUR, RANDHIR P.S.
分类号
H01L21/324(2006.01)
主分类号
H01L21/324(2006.01)
代理机构
代理人
蔡坤财;李世章
主权项
地址
美国
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