HALF TONE MASK

摘要

A half tone mask is provided to be applicable to a photolithography process of many cycles and embody uniform patterning without being restricted in an area of a mask. A half tone mask(100) includes: a transparent substrate(110) made of quartz; a shielding layer(120) formed on the transparent substrate; a transmitting part(121) formed on the transparent substrate; and a semi-transmitting part(130) which is formed on the transparent substrate and transmits only a part of a light with a predetermined wavelength band to be irradiated. The shielding layer is made of a chrome or chrome oxide material. The semi-transmitting part is formed of chrome oxide.