发明名称 MANUFACTURING APPARATUS OF SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a manufacturing apparatus of a semiconductor device capable of cooling a substrate efficiently and uniformly. <P>SOLUTION: A plurality of recesses 21 corresponding to the formation region of a semiconductor device on a substrate 6 are formed on the surface of a mount table 20, an exhaust port 24 of a first refrigerant for cooling the substrate 6 is opened at the center of a recess 21, and an inlet 25 of the first refrigerant is opened at the periphery of the recess 21. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008066339(A) 申请公布日期 2008.03.21
申请号 JP20060239435 申请日期 2006.09.04
申请人 SEIKO EPSON CORP 发明人 OBARA OSAMU
分类号 H01L21/3065;C23C14/50;C23C16/458;H01L21/205;H01L21/683 主分类号 H01L21/3065
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