发明名称 PIXEL STRUCTURE AND FABRICATION METHOD THEREOF
摘要 A pixel structure including a substrate, a gate, a dielectric layer, a semiconductor layer, a plurality of semiconductor bumps, a source, a drain and a reflective pixel electrode is disclosed. The gate is disposed on the substrate. The dielectric layer is disposed on the substrate and covers the gate. The semiconductor layer is disposed on the dielectric layer over the gate. The semiconductor bumps are disposed on the dielectric layer. The source and drain are disposed on the semiconductor layer. The reflective pixel electrode covering the semiconductor bumps is disposed on the dielectric layer and electrically connected to the drain.
申请公布号 US2008062364(A1) 申请公布日期 2008.03.13
申请号 US20060617744 申请日期 2006.12.29
申请人 AU OPTRONICS CORPORATION 发明人 LEE YI-WEI;CHU CHING-YUN;HUANG TZUFONG
分类号 G02F1/1335 主分类号 G02F1/1335
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