发明名称 Culture substrate with an oxidized silicon surface
摘要 <p>Solid culture substrate comprises a surface with a coating made of material like oxidized silicones and a nanoporosity of surface. The coating has a nanostructural and/or nanorugosity of surface. Independent claims are included for: (1) a process of preparing the culture substrate comprising depositing an organosilicate precursor mixed with oxygen by plasma-enhanced chemical vapor deposition (PECVD) on the substrate to form, or depositing a coating i.e. more organic and not very crosslinkable type like an organosilicate precursor mixed with a neutral gas by PECVD, treating the coating with a plasma of neutral gas or reducing under the conditions enhancing the gaseous space generation within the material to form the nanoporosity and nanorugosity; and (2) a culturing process for making living biomolecules to grow comprising contacting the substrate with the living biomolecules and a growth culture medium.</p>
申请公布号 EP1897936(A1) 申请公布日期 2008.03.12
申请号 EP20070115688 申请日期 2007.09.05
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 BORELLA, MATHIAS;PLISSONNIER, MARC;ROUVIERE, EMMANUELLE;GAILLARD, FREDERIC
分类号 C12N5/00;C23C16/24 主分类号 C12N5/00
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