发明名称 DISPLAY APPARATUS AND MANUFACTURING METHOD OF THE SAME
摘要 A display apparatus includes a silicon oxide film and a silicon nitride film as a base layer placed on an insulating substrate, a polycrystalline silicon electrode placed on the base layer, a gate insulating film placed on the polycrystalline silicon electrode, and a gate metal electrode placed on the gate insulating film at a position opposite to the polycrystalline silicon electrode. The gate metal electrode partly or entirely covers the edge of the polycrystalline silicon electrode when viewed from the top.
申请公布号 US2008054267(A1) 申请公布日期 2008.03.06
申请号 US20070847873 申请日期 2007.08.30
申请人 发明人 IMAMURA TAKUJI
分类号 H01L21/00;H01L29/786 主分类号 H01L21/00
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