| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alignment device that prevents deformation and damages to a substrate due to alignment and to provide an exposure apparatus using the alignment device. <P>SOLUTION: The alignment device is equipped with a stage (2, 3) that holds a square substrate (W) which is a two-dimensional plane, moves in a first direction within the two-dimensional plane and rotates around an axis orthogonal to the two-dimensional plane; a first imaging apparatus (4a, 4b) that images two portions at positions parting from each other on a rim of one side of the square substrate and outputs the rim images of the two portions; a second imaging apparatus (4c) that images one portion on a rim of another side intersecting the first side and outputs the rim image of the one portion; an image processing circuit (100) that processes the first rim images and the second rim image; and a control section (20) that controls the stage based on the output of the image processing means. <P>COPYRIGHT: (C)2008,JPO&INPIT |
