发明名称 |
FLOATING GATE MEMORY DEVICES AND FABRICATION |
摘要 |
A floating gate memory array comprising transistors having isolated inter-gate dielectric regions with respect to one another and methods of fabricating the same. Floating gate transistors are formed such that each of the floating gate transistors in the array has a floating gate, a control gate and an inter-gate dielectric layer therebetween. The inter-gate dielectric layer for each transistor is isolated from the inter-gate dielectric of each of the other transistors in the array. Methods of fabricating such structures are also provided. |
申请公布号 |
WO2007149515(A3) |
申请公布日期 |
2008.02.21 |
申请号 |
WO2007US14431 |
申请日期 |
2007.06.20 |
申请人 |
MICRON TECHNOLOGY, INC.;ARITOME, SEIICHI |
发明人 |
ARITOME, SEIICHI |
分类号 |
H01L21/8247;H01L27/115 |
主分类号 |
H01L21/8247 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|