发明名称 FLOATING GATE MEMORY DEVICES AND FABRICATION
摘要 A floating gate memory array comprising transistors having isolated inter-gate dielectric regions with respect to one another and methods of fabricating the same. Floating gate transistors are formed such that each of the floating gate transistors in the array has a floating gate, a control gate and an inter-gate dielectric layer therebetween. The inter-gate dielectric layer for each transistor is isolated from the inter-gate dielectric of each of the other transistors in the array. Methods of fabricating such structures are also provided.
申请公布号 WO2007149515(A3) 申请公布日期 2008.02.21
申请号 WO2007US14431 申请日期 2007.06.20
申请人 MICRON TECHNOLOGY, INC.;ARITOME, SEIICHI 发明人 ARITOME, SEIICHI
分类号 H01L21/8247;H01L27/115 主分类号 H01L21/8247
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