| 摘要 |
A guide apparatus of a wet station is provided to minimize a contact portion with a wafer and avoid a vortex of a cleaning solution by forming a streamlined guide between slots and by tilting a wafer placement part under the slot. A plurality of first slots(116) into which part of the edge of a wafer is inserted are formed in a central support rod(110). Lateral support rods, installed at both sides of the central support rod and corresponding to the first slots, includes a plurality of second slots into which another part of the edge of the wafer is inserted. The central support rod is of a streamlined shape in which the cross section of a gap between the first slots is reduced as it goes upward. A guide apparatus of a wet station includes the central support rod and the lateral support rods wherein a wafer can be fixed to a process bath of the wet station.
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