| 摘要 |
<p>A negative resist composition is provided to ensure higher resolution than the conventional hydroxystyrene-based, novolac-based resist materials and form a good pattern profile after exposure. A negative resist composition includes at least a polymer compound having a repeat unit of hydroxyvinylnaphthalene represented by the following formula 1, wherein R^1 represents a hydrogen atom or methyl group, m is 1 or 2, and a is in the range of 0<a<=1. The polymer compound has a mass average molecular weight of 1,000-500,000. A patterning method includes the steps of: coating a substrate with the negative resist composition; heating the coated substrate, and exposing the heated substrate to high energy rays; and developing the exposed substrate using a developer.</p> |
