发明名称 MONITORING DEVICE AND METHOD OF PLASMA ELECTRON DENSITY AND ELECTRON TEMPERATURE
摘要 <P>PROBLEM TO BE SOLVED: To provide a monitoring device and method of plasma electron density and electron temperature capable of measuring correctly and monitoring in real time the electron density and electron temperature of plasma, and suitable for a mass-production process. <P>SOLUTION: The monitoring device is constructed of an electromagnetic wave generator 300 from which electromagnetic wave of a series of frequency band is transmitted continuously, an electromagnetic wave transmitter receiver 200 which is connected to plasma 100a in a reactor vessel 100 so that the frequency of the transmitted electromagnetic wave may have correlations with the electron density and electron temperature of plasma and is connected electrically to the electromagnetic generator 300 to transmit the electromagnetic wave, a frequency analyzer 400 which is connected electrically to the electromagnetic transmitter receiver 200 so as to analyze the frequency of the electromagnetic wave received from the electromagnetic wave transmitter receiver 200, and a computer 500 which computes correlations of the electron density and electron temperature with each electromagnetic wave based on the transmission command for every frequency band and the analysis data of the electromagnetic wave. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008016423(A) 申请公布日期 2008.01.24
申请号 JP20060225802 申请日期 2006.08.22
申请人 KOREA RESEARCH INST OF STANDARDS & SCIENCE 发明人 KIM JUNG HYUNG;YUN JU-YOUNG;SEONG DAE JIN
分类号 H05H1/00;C23C16/505;H01L21/3065;H01L21/31 主分类号 H05H1/00
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