| 摘要 |
This vacuum processing apparatus has a fixed processing chamber 24 and two movable load lock chambers 28 a and 28 b. A gate valve 26 is provided on the processing chamber 24, and gate valves 30 are respectively provided on the load lock chambers 28 a and 28 b. Each of the load lock chambers 28 a and 28 b is moved in a Y direction by a preparatory chamber moving mechanism 34. A vacuum seal 54, which is expandable and shrinkable so as to vacuum seal a gap G between the gate valves 26 and 30 which are set close to each other during the expansion, is provided around a peripheral edge portion of the processing chamber gate valve 26. Further, a substrate transporting mechanism for transporting a substrate 2 between the processing chamber 24 and each of the load lock chambers 28 a and 28 b set close thereto. |
