摘要 |
PROBLEM TO BE SOLVED: To provide a method of fabricating an active device array substrate, which can eliminate irregularity of MVA LCD, and improve the transmittance and aperture ratio. SOLUTION: First, a substrate is provided. A pixel array is formed on the substrate. An alignment material layer having a plurality of alignment regions is formed on the pixel array. A mask layer is formed on a portion of the alignment regions on the alignment material layer by using an inkjet printing process, so as to expose another portion of the alignment regions on the alignment material layer. Then, a particle beam alignment process is performed to the exposed alignment material layer. Then, the mask layer is removed. Another mask layer is formed on the alignment material layer which has been treated by the particle beam to expose the alignment material layer not treated by the particle beam. Another particle beam alignment process is performed to the exposed alignment material layer, and then the another mask layer is removed. COPYRIGHT: (C)2008,JPO&INPIT
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