发明名称 Processing of semiconductor components with dense processing fluids
摘要 Apparatus for processing an article with a single-phase supercritical dense processing fluid in a processing chamber while applying ultrasonic energy during processing. The single-phase supercritical dense fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. A processing agent may be added to the pressurization vessel, to the processing chamber, or to the single-phase supercritical dense fluid during transfer from the pressurization vessel to the processing chamber. The ultrasonic energy may be generated continuously at a constant frequency or at variable frequencies. Alternatively, the ultrasonic energy may be generated intermittently.
申请公布号 US2008000505(A1) 申请公布日期 2008.01.03
申请号 US20070832968 申请日期 2007.08.02
申请人 发明人 MCDERMOTT WAYNE T.;SUBAWALLA HOSHANG;JOHNSON ANDREW D.;SCHWARZ ALEXANDER;OCKOVIC RICHARD C.
分类号 B08B13/00 主分类号 B08B13/00
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