| 摘要 |
DISCLOSED IN AN ALKALI-SOLUBLE, FILM-FORMING NOVOLAK RSIN MIXTURE CONTAINING AT LEAST TWO NOVOLAK RESINS, EACH NOVOLAK RESIN CONTAINING THE ADDITION-CONDENSATION REACTION PRODUCT OF AT LEAST ONE PHENOLIC COMPOUND WITH AT LEAST ONE ALDEHYDE SOURCE, WHEREIN THE PHENOLIC COMPOUND FOR FIRST NOVOLAK RESIN CONTAINS 90-100 MOLEOF META-CRESOL, AND THE PHENOLIC COMPOUND FOR THE SECOND NOVOLAK RESIN LESS THAN 50 MOLEOF META-CRESOL. ALSO DISCLOSED IS A PHOTOSENSITIVE COMPOSITION, CONTAINING AN ADMIXTURE OF: a) THE ABOVE-MENTIONED NOVOLAK RESIN MIXTURE ; b) AT LEAST ONE O-QUINONE PHOTOACTIVE COMPOUND; AND c) AT LEAST ONE PHOTORESIST SOLVENT. ALSO DISCLOSED IS A METHOD FOR PRODUCING A MICROELECTRONIC DEVICE BY FORMING AN IMAGE ON A SUBSTRATE, WHICH INVOLVES; a) PROVIDING THE ABOVE-MENTIONED PHOTOSENSITIVE COMPOSITION; b) THEREAFTER, COATING A SUITABLE SUBSTRATE WITH THE PHOTORESIST COMPOSITIONN FROMSTEP a); THEREAFTER, HEAT TREATING THE COATED SUBSTRATE UNTIL SUBSTANTIALLY ALL OF THE SOLVENT IS REMOVED; IMAGE-WISEEXPOSING THE COATED SUBSTRATE ; AND THE REMOVING THE IMAGEWISE EXPOSED OR, ALTERNATIVELY, THE UNEXSPOSED AREAS OF THE COATED SUBSTRATE WITH A SUITABLE DEVELEPOR.
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