Verfahren zur Herstellung eines SOI-Substrats,申请号DE200460008537T-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Verfahren zur Herstellung eines SOI-Substrats
摘要
申请公布号	DE602004008537(T2)	申请公布日期	2007.12.27
申请号	DE200460008537T	申请日期	2004.06.03
申请人	SILTRONIC AG	发明人	SASAKI, TSUTOMU;TAKAYAMA, SEIJI;MATSUMURA, ATSUKI
分类号	H01L21/76;H01L21/02;H01L21/265;H01L21/266;H01L21/762;H01L27/12	主分类号	H01L21/76
代理机构		代理人
主权项
地址

您可能感兴趣的专利

AIR CONDITIONER

CORNER MARKER LAMP

CONTROL METHOD OF POWER TRAIN SYSTEM AND POWER TRAIN SYSTEM

METHOD FOR FORMING HIGH-HARDNESS AND WEAR-RESISTANT FILM

VOICE NOISE REMOVING CIRCUIT AND METHOD

EQUIPMENT FOR MANUFACTURING SQUARE STEEL PIPE

NEEDLE MANAGEMENT DEVICE FOR SEMICONDUCTOR CHIP SUPPLY DEVICE

METHOD FOR FORMING OPERATIONAL RECIPE OF POLISHING DEVICE

APPARATUS AND METHOD OF MACHINING INJECTOR NOZZLE

WIPING THREAD BODY FOR MOP AND MOP

HIGH-FREQUENCY SUBSTRATE

DIRECTION INDICATOR FOR INDICATING OPPOSITE DIRECTION

INTEGRATED CIRCUIT STRUCTURE

SYSTEM AND METHOD FOR CONTROLLING COMBUSTION DYNAMICS

IMAGE PROCESSOR, IMAGE PROCESSING METHOD, PROGRAM, AND RECORDING MEDIUM

INFORMATION PROCESSING APPARATUS, KEY UPDATE METHOD, AND PROGRAM

AMPLIFIER AND RF POWER MODULE USING THE SAME