| 摘要 |
<p>A substrate process apparatus is provided to eliminate the necessity for horizontally adjusting a lower case itself by maintaining an airtightness state by its own weight. A mount table on which a substrate(W) is placed is installed in a case(1) of a substrate process apparatus. The case is divided into upper and lower cases(2,3). The periphery of the upper case is placed on a support member(5), supported by the support member. The lower case can move up and down with respect to the upper case while the mount table is supported by the lower case. The lower case can rise up to make the upper surface(3a) of the lower case come in contact with the lower surface(2a) of the upper case and to lift up the upper case from the support member. The lower surface of the upper case airtightly comes in contact with the upper surface of the lower case by its own weight.</p> |
