发明名称 |
LASER IRRADIATION APPARATUS, LASER SCRIBING METHOD, METHOD OF MANUFACTURING ELECTROPTIC DEVICE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a laser irradiation apparatus capable of scribing a work with high productivity, and a laser scribing method and a method of manufacturing an electroptic device each using the laser irradiation apparatus. <P>SOLUTION: The laser irradiation apparatus 100 is equipped with: a laser beam source 101 for emitting laser beams; a condensing mechanism 103 having a plurality of condenser lenses; a servo motor 104 as a driving section for driving the condensing mechanism 103 so that any one of the plurality of condenser lenses is arranged on the optical axis 101a of the laser beams; a Z-axis slide mechanism 104c as a first moving mechanism capable of moving the condensing mechanism 103 in the direction of the optical axis 101a so that the condensing point of laser beams is located inside a substrate W as an object; an X-axis slide section 108 and a Y-axis slide section 106 as second moving mechanisms which can relatively move a stage 105 on which the substrate W is placed in a plane substantially orthogonal to the optical axis 101a of laser beams; and a main computer 120 as a control section for controlling each constitution. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
申请公布号 |
JP2007326127(A) |
申请公布日期 |
2007.12.20 |
申请号 |
JP20060159387 |
申请日期 |
2006.06.08 |
申请人 |
SEIKO EPSON CORP |
发明人 |
YAMADERA SHOICHI;UMETSU KAZUNARI |
分类号 |
B23K26/06;B23K26/00;B23K26/08;B23K101/40;G02F1/13 |
主分类号 |
B23K26/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|