MANUFACTURING METHOD OF SUBSTRATE HAVING TRANSPARENT CONDUCTIVE FILM

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method capable of reducing the specific resistance of an ITO film formed by a sputtering method, and enhancing the heat resistance and the acid resistance of the ITO film. SOLUTION: The manufacturing method of a substrate with a transparent conductive film includes: a step of depositing an Sn-containing indium oxide film on a transparent substrate by a sputtering method; and a step of exposing the substrate having the Sn-containing indium oxide film in plasma generated from gaseous oxygen while the gas pressure of gaseous oxygen in a chamber is≥300 Pa. It is preferable that the gas pressure is 400-1,700 Pa. COPYRIGHT: (C)2008,JPO&INPIT