| 摘要 |
PROBLEM TO BE SOLVED: To provide a metal deposition method capable of depositing a metal on the surface of a substrate in the atmosphere in nano-order precision without employing a chamber. SOLUTION: The metal deposition method deposits a metal in a minute region that suits minute patterns 12 which are drawn on a photo mask 11. In the metal deposition method, a substrate 13 formed with an organic metal salt film on the surface thereof is disposed in the proximity of a patterned surface of the photo mask 11 having previously formed minute patterns 12. Light is irradiated to the photo mask 11, and near-field light is generated in a local region suiting the minute patterns 12 formed on the patterned surface based on the irradiated light. The metal is discomposed by exposing the organic metal salt film, which is disposed in the proximity of the patterned surface, to the generated near-field light. Then, the discomposed metal is deposited on the substrate 13. COPYRIGHT: (C)2008,JPO&INPIT
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