| 摘要 |
An electrostatic adsorption apparatus is provided to prevent a scratch of a glass substrate or a wafer when performing the electrostatic adsorption and to extend a life cycle by an improved corrosion proof about a cleaning gas based on fluorine. An insulating layer(5) forming an adsorption plane is formed by covering an electrode for electrostatic adsorption formed at a side of a support substrate(2). The insulating layer contains a carbon, and one or more element selected from a group consisting of a silicon, an aluminum, an yttrium and a titanium, and a pyrolytic boron nitride having a Vickers hardness within a range of 50 to 1000 Hv.
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