| 摘要 |
<p>Disclosed is a positive resist composition containing a resin component (A) and an acid generator component (B) which generates an acid when exposed to light. The acid generator component (B) contains an acid generator (B1) represented by the following general formula (B1). (B1) [In the formula, R51 represents a straight chain, branched chain or cyclic alkyl group, or a straight chain, branched chain or cyclic fluorinated alkyl group; R52 represents a hydrogen atom, a hydroxyl group, a halogen atom, a straight chain, branched chain or cyclic alkyl group, a straight chain or branched chain halogenated alkyl group, or a straight chain or branched chain alkoxy group; R53 represents an optionally substituted aryl group; and n represents an integer of 1-3.]</p> |
