| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition and a resist pattern forming method for forming a resist pattern with reduced line width roughness. <P>SOLUTION: The positive resist composition comprises a resin component (A) which undergoes an increase in the alkali solubility by the action of an acid and an acid generator component (B) capable of generating an acid upon exposure to light, wherein the resin component (A) has a tertiary alkyl ester type acid-dissociable dissolution inhibiting group and the acid generator component (B) comprises an onium salt (B1) having a fluorine atom-containing anionic moiety and an onium salt (B2) having a fluorine atom-free anionic moiety. <P>COPYRIGHT: (C)2008,JPO&INPIT |
