| 摘要 |
An area with a low via pattern density is extracted from a semiconductor integrated circuit that includes the first wirings and the second wirings disposed on the upper layer of the first wirings, based on wiring layout information. Then, dummy via patterns connected either to the first wirings or the second wirings are disposed in the peripheral area of the via patterns within the selected area. With this, the dummy via can be disposed even in an area where the wirings are congested.
|
