APPARATUS AND METHOD FOR ETCHING AND EDGE OF A SUBSTRATE

摘要

An apparatus and a method for processing a substrate are provided to block a center portion of the substrate from inflow of fume of a treatment liquid and micro particles floated in the air, when removing the remaining polluted material. A support member(14) supports the substrate. A treating liquid suppler(20) injects the treating liquid to the substrate mounted on the support member. A protection cover(100) prevents a center portion of the substrate from inflow of the treating liquid. A polluted material preventing member is installed to block an edge portion and the center portion of the substrate for preventing the center portion from being polluted from the polluted materials.