发明名称 Reaktionsvorrichtung und Mischsystem
摘要 A reaction apparatus comprises a first supply flow channel having a fine flow channel cross sectional area for a liquid pressurized by a pressurizing device, a gas supply flow channel having a fine flow channel cross sectional area for supplying a gas, a two-phase flow channel having a fine flow channel cross sectional area in communication with a joined portion for the first supply flow channel and the second supply flow channel for flowing a gas/liquid two-phase fluid, a gas bubble reaction flow channel in communication with the exit of the gas/liquid two-phase channel and having a flow channel cross sectional area larger than that of the gas/liquid two-phase flow channel, and a liquid discharge flow channel for discharging the liquid in the gas bubble reaction flow channel. Therefore, in the reaction apparatus, a stable mixing ratio of a gas to a liquid can be obtained and the mixing speed of the gas to the liquid is increased.
申请公布号 DE10250406(B4) 申请公布日期 2007.10.25
申请号 DE2002150406 申请日期 2002.10.29
申请人 HITACHI LTD. 发明人 SANO, TADASHI;MIYAKE, RYO;KOIDE, AKIRA;SAHO, NORIHIDE;KONO, AKIOMI;HARADA, TAKESHI
分类号 B01J19/00;B01F3/04;B01F5/02;B01F5/04;B01F13/00;B01F15/00;B01J4/00;B01J10/00;B01J14/00 主分类号 B01J19/00
代理机构 代理人
主权项
地址