发明名称 |
Reaktionsvorrichtung und Mischsystem |
摘要 |
A reaction apparatus comprises a first supply flow channel having a fine flow channel cross sectional area for a liquid pressurized by a pressurizing device, a gas supply flow channel having a fine flow channel cross sectional area for supplying a gas, a two-phase flow channel having a fine flow channel cross sectional area in communication with a joined portion for the first supply flow channel and the second supply flow channel for flowing a gas/liquid two-phase fluid, a gas bubble reaction flow channel in communication with the exit of the gas/liquid two-phase channel and having a flow channel cross sectional area larger than that of the gas/liquid two-phase flow channel, and a liquid discharge flow channel for discharging the liquid in the gas bubble reaction flow channel. Therefore, in the reaction apparatus, a stable mixing ratio of a gas to a liquid can be obtained and the mixing speed of the gas to the liquid is increased. |
申请公布号 |
DE10250406(B4) |
申请公布日期 |
2007.10.25 |
申请号 |
DE2002150406 |
申请日期 |
2002.10.29 |
申请人 |
HITACHI LTD. |
发明人 |
SANO, TADASHI;MIYAKE, RYO;KOIDE, AKIRA;SAHO, NORIHIDE;KONO, AKIOMI;HARADA, TAKESHI |
分类号 |
B01J19/00;B01F3/04;B01F5/02;B01F5/04;B01F13/00;B01F15/00;B01J4/00;B01J10/00;B01J14/00 |
主分类号 |
B01J19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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