发明名称 EXPOSURE DEVICE AND SUBSTRATE PROCESSING SYSTEM AND DEVICE PRODUCING METHOD
摘要 A first main body unit (ST1) supporting a substrate stage (WST1) is supported at four points by an antivibration unit (16A, 16B, etc.) and a second main body unit (ST2) holding a projection optical system (PL) is supported at three points on the first main body unit by a second antivibration unit (24A, 24B, etc.) Therefore, the first main body unit and substrate stage are supported stably and with high rigidity, and unlike, for example, the case where the first main unit is supported at three points, maintenance for the stage portion from the device back side (- x side) becomes possible. Further, since antivibration units are prepared in two serial stages, the effect of suppressing the background vibration from the floor surface is high. Therefore, this ensures improved yield of devices by precision exposure, improved device operating rate due to the reduction of maintenance time, and hence improved productivity for devices that are final products.
申请公布号 WO02084720(A3) 申请公布日期 2007.10.25
申请号 WO2002JP03318 申请日期 2002.04.03
申请人 NIKON CORPORATION;NISHI, KENJI 发明人 NISHI, KENJI
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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