PHOTOMASK USING ALUMINIUM FILM AND METHOD FOR MANUFACTURING THEREOF

摘要

A photomask using an aluminum film, and a method for preparing the photomask are provided to allow a photoresist and an aluminum film to be etched simultaneously by using a developer, thereby reducing process and time. A photomask using an aluminum film comprises a transparent substrate(110); a light transparent part which is formed on the transparent substrate and transmits the irradiated light of a certain wavelength; and a light nontransparent part(160) which is formed on the transparent substrate and blocks the irradiated light of a certain wavelength, wherein the light nontransparent part and the light transparent part are formed by patterning an aluminum film(120) formed on the transparent substrate. Preferably the aluminum film is made of aluminum or a composite comprising aluminum and an additive and has a thickness of 10-500 nm.