| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a stage-cum-electrode structure of a plasma treatment device, capable of avoiding formation of treatment uneveness, without being demanded of severe accuracy. <P>SOLUTION: A lifting and lowering member 30 is located so that it comes close to the outside of a planar surface of a main stage 21, serving also as a grounding electrode of the plasma treatment apparatus M. The lifting and lowering member 30 is located in the upper position, projected upward from the main stage 21 with a lifting and lowering mechanism 50. After the perimeter Wb of a processing object W is set on an installation plane 31a, the lifting and lowering member 30 is located at the lower position so that the installation plane 31a will not project from the upper surface 21a of the main stage 21, while the perimeter of the processing object W is made to project above the main stage 21. <P>COPYRIGHT: (C)2008,JPO&INPIT |
