| 摘要 |
A substrate cleaning apparatus and a cleaning method thereof are provided to improve cleaning performance for the substrate by forming a plurality of bodies of a cleaning head and locating a sprayer between the bodies for removing dusts or drugs, and by performing cleaning process while simultaneously spraying a cleaning solution and a cleaning gas on the substrate. A substrate cleaning apparatus includes a plurality of bodies(125a,125b) spraying a cleaning solution, a plurality of sprayers(150) located between the bodies, a first supply pipe(120) connecting the bodies with the sprayers, a second supply pipe(118) connected for supplying deionized water to each of the bodies, and an angle control unit provided to the first supply pipe for controlling angles of the bodies and the sprayers.
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