发明名称 METHOD FOR MANUFACTURING SPUTTERING TARGET FOR FORMING OPTICAL RECORDING MEDIUM PROTECTIVE FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a sputtering target with reduced generation of abnormal discharge for formation of a protective film for an optical recording medium which performs recording, reproducing, recording and reproducing, and further erasing of information by laser light. <P>SOLUTION: The method for manufacturing the sputtering target for forming the protective film of the optical recording medium is characterized by hot pressing a powder mixture obtained by compounding and mixing the powder mixture so as to contain 10 to 30 mol% conductive zinc oxide powder or zinc oxide powder, 1 to 15 mol% gallium oxide powder, 1 to 15 mol% indium oxide powder, and 1 to 5 mol% silicon dioxide powder having hydrophobicity on the surface and the balance zinc sulfide powder. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007270253(A) 申请公布日期 2007.10.18
申请号 JP20060097224 申请日期 2006.03.31
申请人 MITSUBISHI MATERIALS CORP 发明人 SHIRAI TAKANORI;MISHIMA TERUSHI;MASHIMA MUNETAKA;KOMIYAMA SHOZO
分类号 C23C14/34;C04B35/00;C04B35/453;G11B7/26 主分类号 C23C14/34
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