发明名称 METHOD OF FORMING DYNAMIC RANDOM ACCESS MEMORY AND CAPACITOR FORMED IN DYNAMIC RANDOM ACCESS MEMORY
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of forming a dynamic random access memory having a highly stored capacitance using a dielectric layer having a high dielectric constant. <P>SOLUTION: The method includes: a process for preparing a substrate at least having a drain region and a bottom electrode to be electrically coupled to the drain region, a process for forming a first barrier layer on the bottom electrode, a process for forming a dielectric layer having a high dielectric constant, a process for forming a second barrier layer on the dielectric layer, and a process for forming an uppermost electrode. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007266617(A) 申请公布日期 2007.10.11
申请号 JP20070112100 申请日期 2007.04.20
申请人 VANGUARD INTERNATL SEMICONDUCTOR CORP 发明人 SHI BOCHO;HO KANKETSU;CHO RANRIN
分类号 H01L21/8242;H01L21/316;H01L27/108 主分类号 H01L21/8242
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