发明名称 |
METHOD OF FORMING DYNAMIC RANDOM ACCESS MEMORY AND CAPACITOR FORMED IN DYNAMIC RANDOM ACCESS MEMORY |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of forming a dynamic random access memory having a highly stored capacitance using a dielectric layer having a high dielectric constant. <P>SOLUTION: The method includes: a process for preparing a substrate at least having a drain region and a bottom electrode to be electrically coupled to the drain region, a process for forming a first barrier layer on the bottom electrode, a process for forming a dielectric layer having a high dielectric constant, a process for forming a second barrier layer on the dielectric layer, and a process for forming an uppermost electrode. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2007266617(A) |
申请公布日期 |
2007.10.11 |
申请号 |
JP20070112100 |
申请日期 |
2007.04.20 |
申请人 |
VANGUARD INTERNATL SEMICONDUCTOR CORP |
发明人 |
SHI BOCHO;HO KANKETSU;CHO RANRIN |
分类号 |
H01L21/8242;H01L21/316;H01L27/108 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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