PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

摘要

An apparatus for processing plasma and a method for processing the plasma are provided to maintain the uniformity of a process stably even when the change of elapsed time is generated by repeating the collection of a plasma process. A method for processing plasma includes the steps of: attaching a first electrode to a processing container(10) through an insulator(52) or a space; electrically connecting the first electrode to a ground electric potential through a capacitance variable unit of capacitance variableness; and converting the capacitance of the capacitance variable unit according to a process condition of a plasma process performed on a substrate.