| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent wrong alignment of a mask and a substrate, using an alignment mark for a different coloring pattern. <P>SOLUTION: A plurality of alignment marks 4R for the coloring pattern of R, a plurality of alignment marks 4G for the coloring pattern of G, and a plurality of alignment marks 4B for the coloring pattern B are disposed on a mask 2 at different intervals for each coloring pattern. A plurality of alignment marks 3R for the coloring pattern of R, a plurality of alignment marks 3G for the coloring pattern of G, and a plurality of alignment marks 3B for the coloring pattern of B are disposed on a substrate 1 at different intervals for each coloring pattern. The alignment of the mask 2 and the substrate 1 is carried out by the positionings of the plurality of the alignment marks disposed on the mask 2 and the positionings of the plurality of the alignment marks disposed on the substrate 1. <P>COPYRIGHT: (C)2008,JPO&INPIT |
