| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprinting method capable of thinning a resist film capable of being subjected to surface treatment in order to enhance mold releasability and useful for forming a good pattern of a nanometer order. SOLUTION: A mold having an uneven surface of a predetermined pattern and a substrate having the resist film formed on its surface are superposed one upon another so that the uneven surface and the resist film are opposed to each other and the uneven shape of the uneven surface of the mold is transferred to the resist film. In this imprinting method, the resist film comprises an amorphous carbon film. COPYRIGHT: (C)2008,JPO&INPIT
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