发明名称 LITHOGRAPHY DEVICE HAVING CONTROLLED MOTOR, AND MOTOR CONTROL SYSTEM AND METHOD
摘要 <P>PROBLEM TO BE SOLVED: To compensate a change of a motor constant caused by a temperature change of permanent magnet in a motor control system for positioning a lithography device. <P>SOLUTION: A positioning system positions a patterning support and a substrate support. The positioning system has a motor including a stator and a mover connected to the supports, and the motor control system including a controller for providing an output for controlling a current applied to the motor. The motor control system determines a controller output required for compensating for the weights of the mover and the related supports, determines a deviation from an output required for compensating for weights applied to the mover and the related supports, and corrects a current applied to the motor based on the deviation. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007258676(A) 申请公布日期 2007.10.04
申请号 JP20070000743 申请日期 2007.01.05
申请人 ASML NETHERLANDS BV 发明人 COX HENRIKUS HERMAN MARIE;BUTLER HANS;HOL SVEN ANTOIN JOHAN
分类号 H01L21/027;G03F7/20;H01L21/68;H02K41/03;H02K41/035;H02P25/06 主分类号 H01L21/027
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