发明名称 LASER ANNEALING APPARATUS
摘要 <p>A laser annealing apparatus is provided to transmit laser power without damaging end surfaces of slender optical fibers even when a green laser with a high peak power is used as a heating light source in the crystallization annealing process of a low-temperature poly-silicon TFT. At least one of partially reflective mirrors(2-1 to 2-m) splits a laser beam emitted from laser oscillators(1-1 to 1-k) having a Q switching action into plural laser beams. Plural optical fibers(5-1 to 5-n) transmit the laser beams split by the partially reflective mirrors, respectively, with each emission end being arranged linearly in a cross direction. A first optical system synthesizes and homogenizes the laser beams emitted from the optical fibers, and a second optical system focuses the laser beam emitted from the first optical system on a surface of a work piece as a rectangular laser beam.</p>
申请公布号 KR20070096958(A) 申请公布日期 2007.10.02
申请号 KR20070029416 申请日期 2007.03.26
申请人 LASERFRONT TECHNOLOGIES, INC. 发明人 MORITA HIROYUKI
分类号 H01L21/324;H01L29/786 主分类号 H01L21/324
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