发明名称 ELECTRO-OPTICAL DEVICE MANUFACTURING METHOD, ELECTRO-OPTICAL DEVICE MANUFACTURED BY THE SAME, AND ELECTRONIC EQUIPMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an electro-optical device manufacturing method, in which whether the depth of a division start area to be a start for dividing a substrate to be used for an electro-optical device from a large substrate is formed in set depth can be confirmed easily. <P>SOLUTION: The electrooptical device manufacturing method is provided with a division start area forming process (steps S2, S5, S8, S11) for forming a first reforming area along a division schedule line in set depth, in a mother substrate to form the division start region to be a start for division; an index-forming process (steps S1, S3, S4, S6, S7, S9, S10, S12) for forming a second reform region larger than the first reform region in the mother substrate in the same set depth as the division start region to form an index; and a division start area confirming process (steps S13 to S16) for estimating and confirming, at least the depth in the formed division start region by confirming the depth of the index. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007248700(A) 申请公布日期 2007.09.27
申请号 JP20060070684 申请日期 2006.03.15
申请人 SEIKO EPSON CORP 发明人 MARUYAMA HIROMOTO
分类号 G09F9/00;B23K26/38;B23K26/40;B23K101/36;G02F1/13 主分类号 G09F9/00
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